[9 Sep (Sun)] Full-day Workshops
Introduction to EpiDoc
EpiDoc (http://www.stoa.org/epidoc/gl/latest/) is one of the most successful TEI customizations in existence. It was originally developed to encode Greek and Roman documents written on stone or other non-perishable materials, but has been generalized to work with other types of document where the scholars who study them care principally about recording not just the transcription, but the text's materiality and the editorial interventions that have been made to establish a readable text. For example, EpiDoc has been used to publish documents on papyrus in a variety of languages, and has been used for other ancient documents in a variety of languages and scripts (including Arabic, Egyptian Hieroglyphs, Hebrew, Mayan Hieroglyphs, and Old Cham).
The wide adoption of Epidoc, as well as the fact that it is a TEI customization, allow its users to take advantage of support and advice from a community of scholars, shared tools for display and analysis, the development of common practices and vocabularies to make it easier to share and re-use Epidoc corpora.
We expect the workshop to appeal both to scholars working on western epigraphy and papyrology in Japan and to those working with similar documents from Japan or other countries with their own epigraphic or papyrological traditions. We also anticipate that there will be an opportunity for participants to discuss their own projects.
The workshop will cover the following topics:
- Brief introduction to XML, TEI and Epidoc
- Basic editing of epigraphic texts.
- OxygenXML software for editing and transforming into HTML for proofreading and display.
- Encoding the history and description of the textual support.
- Advanced Features (apparatus criticus, verse, complex texts). This section will be adjusted based on the interests of the participants.
Participants should have some familiarity with epigraphic, papyrological or similar textual material. An understanding of the Leiden Conventions is helpful but not required. No technical skills are required and scholars of all levels, from students to professors, are welcome.